You have developed an idea for using a poly Si surface‐ micromachined cantilever. Initially, you designed a process flow for creating this simple structure, and the process flow is detailed in the figure below. ( cross section view and top view)There are several critical errors with this process (things that won’t work or won’t produce the result). Please find the critical errors in this process flow and, where possible, suggest alternate approaches. Do not worry about the accumulation of errors, but rather treat each step assuming that the structure up to that step could be created.This structure is actually quite simple to make. Develop a simpler process flow and associated masks to create the final structure. Be sure to show cross‐sectional and planar views of all key steps in the process.

Introductory Circuit Analysis (13th Edition)
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You have developed an idea for using a poly Si surface‐ micromachined cantilever. 
Initially, you designed a process flow for creating this simple structure, and the process flow is detailed in the figure below. ( cross section view and top view)
There are several critical errors with this process (things that won’t work or won’t produce the result). Please find the critical errors in this process flow and, where possible, suggest alternate approaches. Do not worry about the accumulation of errors, but rather treat each step assuming that the structure up to that step could be created.
This structure is actually quite simple to make. Develop a simpler process flow and associated masks to create the final structure. Be sure to show cross‐sectional and planar views of all key steps in the process.

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